Hexagonal Silicon Nitride

Si3N4_0001_multislice.emd [25.5 Mb]

This file is a HRTEM multislice simulation of hexagonal silicon nitride (\beta-\rm{Si}_3\rm{N}_4), with thicknesses and defocus values ranging from 2 to 50 nm. The accelerating voltage was 300 kV and the crystal is oriented along the [0001] zone axis. The 5 dimensions included are:

  1. x pixel direction (0 to 1.308 nm).
  2. y pixel direction (0 to 0.751 nm).
  3. Si3N4 crystal thickness (2 to 50 nm in steps of 2 nm).
  4. Microscope defocus (0 to 50 nm in seps of 2 nm).
  5. Complex number (length of two, corresponding to real and imaginary).